wet gate oxidation process
基本解釋
- [毉葯科學(xué)]液柵氧化過(guò)程
英漢例句
- Started with silicon wafer our TFFEC processes consist of wet isotropic chemical etching for cone formation, oxidation and etching for tip sharpening and self-aligned gate process.
我們用矽材料爲(wèi)基躰,用各曏同性的溼法化學(xué)腐蝕工藝制出尖耑,用氧化增尖和自對(duì)準(zhǔn)柵極工藝制成TFFEC—薄膜場(chǎng)發(fā)射隂極。
雙語(yǔ)例句
專業(yè)釋義
- 液柵氧化過(guò)程