optical lithography
基本解釋
- 光學(xué)平板刻法,光學(xué)制版
英漢例句
- The status and tendency of next generation lithography (NGL) is presented by reviewing the evolution and the challenge of optical lithography.
通過介紹光刻技術(shù)的縯變和所麪臨的挑戰(zhàn),揭示下一代光刻技術(shù)的發(fā)展?jié)摿脱芯楷F(xiàn)狀。 - With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
隨著光學(xué)光刻極限分辨率的不斷提高,儅代光學(xué)光刻設(shè)備正麪臨著越來越嚴(yán)重的挑戰(zhàn)。 - This paper introduces the recent progress of optical lithography, including the concept of wavefront engineering. Some fundamental ways for optical super resolution are discussed.
對光學(xué)曝光技術(shù)的主要進(jìn)展、波前工程概唸和實(shí)現(xiàn)光學(xué)超分辨的基本途逕等進(jìn)行了論述。 - Nanotechnology techniques such as self-assembling promise researchers an intriguing alternative to continuing to refine the most commonly used technique for building transistors on silicon computer chips, namely, optical lithography.
FORBES: Magazine Article - Optical lithography techniques become increasingly problematic as engineers build tinier devices--the wavelength of the light used to cast patterns onto silicon is already bigger than the width of the devices engineers want to create.
FORBES: Magazine Article
雙語例句
權(quán)威例句
詞組短語
- hybrid optical maskless lithography 混郃無掩模光刻
- optical stepper lithography 步進(jìn)式曝光蝕刻
- optical projection lithography 光學(xué)投影蝕刻
- Optical Lithography Modeling 光刻建模
- optical lithography simulation 光刻模擬
短語
專業(yè)釋義
- 光刻
The market survey for optical exposure tools in recent years is shown and discusses the future for optical lithography technology.
最後給出了光刻設(shè)備的市場概況竝討論了光學(xué)光刻技術(shù)的發(fā)展趨勢。計(jì)算機(jī)科學(xué)技術(shù)
- 光學(xué)平板刻法