optical photolithography

基本解釋

At the present time, micro optical elements with continuous relief structure are usually fabricated by the multi-mask photolithography.
目前一般采用多個(gè)二元掩模多次套刻的方法來(lái)制作連續(xù)微浮雕結(jié)構(gòu)，用量化的臺(tái)階去逼近理想的輪廓。
It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
它順應(yīng)了光學(xué)元件微小化和陣列化的趨勢(shì)，在光刻、光纖通信、光學(xué)信息處理等領(lǐng)域有著廣闊的應(yīng)用前景。